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Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD
Pure nickel Round disc sputtering Arc target for PVD
Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD Pure nickel Round disc sputtering Arc target for PVD

Pure nickel Round disc sputtering Arc target for PVD

Price range USD20 USD ($)/Set

Product Details:

  • Feature High purity, high compactness. The US standard products ASTM B564.
  • Product Type Ferrous Metals
  • Material Pure Nickel
  • Shape Lump
  • Chemical Composition Nickel
  • Purity 99.95%
  • Weight Actual weight Kilograms (kg)
  • Supply Ability : 2000 Set Per Month
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Price And Quantity

  • 1 Set
  • 20.00 - 30.00 USD ($)/Set
  • Price range USD20 USD ($)/Set

Product Specifications

  • Actual weight Kilograms (kg)
  • 8.9 Gram per cubic centimeter(g/cm3)
  • 99.95%
  • Ferrous Metals
  • Ni 201 Ni200
  • Lump
  • Dia 30-100mm Millimeter (mm)
  • High purity, high compactness. The US standard products ASTM B564.
  • Slivery
  • Pure Nickel
  • Nickel
  • Petrochemical Engineering, Lighting, Metallurgy, Chemical Industry, Electronics, Aerospace

Trade Information

  • SHANGHAI
  • 2000 Set Per Month
  • 14 Days
  • Free samples available with shipping and taxes paid by the buyer
  • The standard DHL package.
  • Africa, Middle East, Western Europe, Eastern Europe, South America, North America, Central America, Australia, Asia
  • All India
  • TUV ISO9001:2005 TUV SGS

Product Description

Application

Many products commonly used today have a coating created through sputtering targets. These coatings include:

Glass Coating

Sputtering targets are used to produce low-radiation coated glass  also known as Low-E glass  which is commonly used in building construction because of its ability to save energy, control light, and for aesthetics.

Solar Cell Coating

Demands for renewable energy are on the rise. Third generation, thin-film solar cells are prepared using sputter coating technology.

Available Materials

These versatile coatings each have different applications for which they are best suited. our most common including:

Tantalum

Used as a barrier layer on silicon wafers for semiconductor production, tantalum is used in all modern electronics. Cell phones, DVD and Blu-ray players, laptops, automobile electronics and even gaming consoles contain tantalum.

Niobium

Commonly used in electronics, niobium has similar properties to tantalum. Niobium is corrosion resistant due to its oxide film and is a considered a superconductor.

Titanium

Found in a wide variety of conventional products including watches, laptops, and bicycles, titanium is lightweight and corrosion resistant. This material is often used for wear-resistance and aesthetic design, but may also be used for semiconductors and optical coatings.

Tungsten

Tungsten thin films are a decorative coating widely used for their thermal, physical, and mechanical properties such as a high melting point and thermal conductivity.

Molybdenum

Having a lower density and consistent pricing, this element can be used in place of tungsten and is commonly used to coat solar panel cells.

Silicon

This target material is most generally used in the production of silicon solar cells.


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