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99.95% Pure Molybdenum round sputtering target for PVD

99.95% Pure Molybdenum round sputtering target for PVD

Product Details:

  • Feature High purity and high compactness. High quality for PVD industry.
  • Product Type Non-ferrous Metal
  • Material molybdenum
  • Shape Lump
  • Chemical Composition 99.95 purity molybdenum
  • Purity 99.95
  • Weight depends actual size Kilograms (kg)
  • Supply Ability : 5000 Set Per Month
30 USD ($)/Set

Price And Quantity

  • 1 Set
  • 30 USD ($)/Set

Product Specifications

  • slivery
  • Pure Mo
  • 99.95 purity molybdenum
  • Non-ferrous Metal
  • High purity and high compactness. High quality for PVD industry.
  • molybdenum
  • depends actual size Millimeter (mm)
  • 10.2 Gram per cubic centimeter(g/cm3)
  • depends actual size Kilograms (kg)
  • Petrochemical Engineering, Lighting, Metallurgy, Chemical Industry, Electronics, Aerospace
  • 99.95
  • Lump

Trade Information

  • Paypal, Telegraphic Transfer (T/T), Letter of Credit at Sight (Sight L/C), Letter of Credit (L/C)
  • 5000 Set Per Month
  • 7 Days
  • Free samples available with shipping and taxes paid by the buyer
  • Standard DHL package.
  • Africa, Middle East, Western Europe, Eastern Europe, South America, North America, Central America, Australia, Asia
  • All India
  • TUV ISO9001:2015 SGS

Product Description

Sputtering Target 

First discovered in 1852 and developed as a thin film deposition technique in 1920, sputtering targets are a physical vapor deposition mechanism—an old process, but with many uses in modern technology and manufacturing. The process starts by feeding a substrate (or other item to be coated) into a vacuum chamber containing two magnets. After introducing a controlled gas (such as argon) into the chamber, powerful magnets pull atoms from the substrate.

These atoms then proceed to collide with each other in their gaseous state before condensing into a plasma that dries into a thin film on the substrate. The final product is a thin but durable coating valid across a variety of applications.


Many products commonly used today have a coating created through sputtering targets. These coatings include:

Glass Coating

Sputtering targets are used to produce low-radiation coated glass – also known as Low-E glass – which is commonly used in building construction because of its ability to save energy, control light, and for aesthetics.

Solar Cell Coating

Demands for renewable energy are on the rise. Third generation, thin-film solar cells are prepared using sputter coating technology.

Available Materials

These versatile coatings each have different applications for which they are best suited. our most common including:


Used as a barrier layer on silicon wafers for semiconductor production, tantalum is used in all modern electronics. Cell phones, DVD and Blu-ray players, laptops, automobile electronics and even gaming consoles contain tantalum.


Commonly used in electronics, niobium has similar properties to tantalum. Niobium is corrosion resistant due to its oxide film and is a considered a superconductor.


Found in a wide variety of conventional products including watches, laptops, and bicycles, titanium is lightweight and corrosion resistant. This material is often used for wear-resistance and aesthetic design, but may also be used for semiconductors and optical coatings.


Tungsten thin films are a decorative coating widely used for their thermal, physical, and mechanical properties such as a high melting point and thermal conductivity.


Having a lower density and consistent pricing, this element can be used in place of tungsten and is commonly used to coat solar panel cells.


Hafnium films are frequently used as an insulator for semiconductors, as well as for surface hardness and protection. As an element with a high dielectric constant, it may improve the performance of some electronics.


This target material is most generally used in the production of silicon solar cells.


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